Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration
Background: Resin infiltration is used to mask enamel opacities and the recommended etching cycles are three. However, anecdotal evidence suggests that favorable esthetics outcomes can be obtained by increasing the etching cycles. Aim: To determine the incremental and total enamel loss when enamel s...
| Published in: | PHOTODIAGNOSIS AND PHOTODYNAMIC THERAPY |
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| Main Authors: | , , , , |
| Format: | Article |
| Language: | English |
| Published: |
ELSEVIER
2024
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| Subjects: | |
| Online Access: | https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001182138700001 |