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Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration
by
Ibrahim
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Dayang Fadzlina Abang; Hasmun
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Noren Nor; Liew
,
Yih Miin; Venkiteswaran
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Annapurny
Published in
PHOTODIAGNOSIS AND PHOTODYNAMIC THERAPY
(2024)
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