Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication

In many microfluidic device fabrications, obtaining the hermetic sealing is a great challenge, especially for bonding between non-homogenous material pairs. This work presents the evaluations of non-homogeneous material bonding between dry film photoresist (DFR) and poly-methyl methacrylate (PMMA) s...

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Published in:INTELLIGENT MANUFACTURING AND MECHATRONICS, SIMM 2023
Main Authors: Yazid, Muhamad Fitri M.; Nawang, Farah M.; Nasir, S. Mohd Firdaus S. A.; Yusof, Azmi M.
Format: Proceedings Paper
Language:English
Published: SPRINGER-VERLAG SINGAPORE PTE LTD 2024
Subjects:
Online Access:https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001313737300035
author Yazid
Muhamad Fitri M.; Nawang
Farah M.; Nasir
S. Mohd Firdaus S. A.; Yusof
Azmi M.
spellingShingle Yazid
Muhamad Fitri M.; Nawang
Farah M.; Nasir
S. Mohd Firdaus S. A.; Yusof
Azmi M.
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
Engineering
author_facet Yazid
Muhamad Fitri M.; Nawang
Farah M.; Nasir
S. Mohd Firdaus S. A.; Yusof
Azmi M.
author_sort Yazid
spelling Yazid, Muhamad Fitri M.; Nawang, Farah M.; Nasir, S. Mohd Firdaus S. A.; Yusof, Azmi M.
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
INTELLIGENT MANUFACTURING AND MECHATRONICS, SIMM 2023
English
Proceedings Paper
In many microfluidic device fabrications, obtaining the hermetic sealing is a great challenge, especially for bonding between non-homogenous material pairs. This work presents the evaluations of non-homogeneous material bonding between dry film photoresist (DFR) and poly-methyl methacrylate (PMMA) substrates using low-pressure and low-temperature direct thermal bonding. DFR is a light-sensitive material and well adhered to the PMMA surface before UV exposure, but its chemical structures changed after being exposed to UV irradiation, which caused the DFR to crosslink permanently. Therefore, the low-pressure and low-temperature (below the glass transition temperature of PMMA, TG = 95 degrees C) bonding evaluation was made by first preparing the base substrate by laminating the DFR on PMMA (PMMA/DFR) and then exposing it under UV i-line irradiation (wavelength 365 nm) for 120 s. The base substrate was later bonded with another PMMA substrate, creating a substrate consisting of the PMMA/DFR + PMMA pairs. Three different surface conditions were evaluated: the PMMA substrate without surface treatment, the PMMA substrate surface treated with isopropanol, and PMMA substrate surface treated with ethanol. Different curing temperatures and times in the inductive oven were carried out. Results revealed that without sufficient clamping pressure, thermal direct bonding of an untreated PMMA substrate surface could not be obtained even after it was cured in an oven at a temperature close to TG. While surface treatment with ethanol revealed promising bonding between PMMA and DFR + PMMA, the bonding coverage area could attain only 50% at best with curing temperature of 90 degrees C for 25 min. Surface treatment with isopropanol revealed an interesting result whereby 90% coverage area of bonded surface obtained when cured in an oven at 90 degrees C for 20 min. Bonding shear stress evaluation produces 1.92 MPa at best. The results obtained in this work offer low-pressure and low-temperature thermal direct bonding which can be used as a guide for future microfluidics device fabrication.
SPRINGER-VERLAG SINGAPORE PTE LTD
2195-4356
2195-4364
2024


10.1007/978-981-97-0169-8_35
Engineering

WOS:001313737300035
https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001313737300035
title Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
title_short Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
title_full Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
title_fullStr Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
title_full_unstemmed Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
title_sort Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
container_title INTELLIGENT MANUFACTURING AND MECHATRONICS, SIMM 2023
language English
format Proceedings Paper
description In many microfluidic device fabrications, obtaining the hermetic sealing is a great challenge, especially for bonding between non-homogenous material pairs. This work presents the evaluations of non-homogeneous material bonding between dry film photoresist (DFR) and poly-methyl methacrylate (PMMA) substrates using low-pressure and low-temperature direct thermal bonding. DFR is a light-sensitive material and well adhered to the PMMA surface before UV exposure, but its chemical structures changed after being exposed to UV irradiation, which caused the DFR to crosslink permanently. Therefore, the low-pressure and low-temperature (below the glass transition temperature of PMMA, TG = 95 degrees C) bonding evaluation was made by first preparing the base substrate by laminating the DFR on PMMA (PMMA/DFR) and then exposing it under UV i-line irradiation (wavelength 365 nm) for 120 s. The base substrate was later bonded with another PMMA substrate, creating a substrate consisting of the PMMA/DFR + PMMA pairs. Three different surface conditions were evaluated: the PMMA substrate without surface treatment, the PMMA substrate surface treated with isopropanol, and PMMA substrate surface treated with ethanol. Different curing temperatures and times in the inductive oven were carried out. Results revealed that without sufficient clamping pressure, thermal direct bonding of an untreated PMMA substrate surface could not be obtained even after it was cured in an oven at a temperature close to TG. While surface treatment with ethanol revealed promising bonding between PMMA and DFR + PMMA, the bonding coverage area could attain only 50% at best with curing temperature of 90 degrees C for 25 min. Surface treatment with isopropanol revealed an interesting result whereby 90% coverage area of bonded surface obtained when cured in an oven at 90 degrees C for 20 min. Bonding shear stress evaluation produces 1.92 MPa at best. The results obtained in this work offer low-pressure and low-temperature thermal direct bonding which can be used as a guide for future microfluidics device fabrication.
publisher SPRINGER-VERLAG SINGAPORE PTE LTD
issn 2195-4356
2195-4364
publishDate 2024
container_volume
container_issue
doi_str_mv 10.1007/978-981-97-0169-8_35
topic Engineering
topic_facet Engineering
accesstype
id WOS:001313737300035
url https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001313737300035
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