Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication
In many microfluidic device fabrications, obtaining the hermetic sealing is a great challenge, especially for bonding between non-homogenous material pairs. This work presents the evaluations of non-homogeneous material bonding between dry film photoresist (DFR) and poly-methyl methacrylate (PMMA) s...
Published in: | INTELLIGENT MANUFACTURING AND MECHATRONICS, SIMM 2023 |
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Main Authors: | , , , , |
Format: | Proceedings Paper |
Language: | English |
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SPRINGER-VERLAG SINGAPORE PTE LTD
2024
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Online Access: | https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001313737300035 |
author |
Yazid Muhamad Fitri M.; Nawang Farah M.; Nasir S. Mohd Firdaus S. A.; Yusof Azmi M. |
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Yazid Muhamad Fitri M.; Nawang Farah M.; Nasir S. Mohd Firdaus S. A.; Yusof Azmi M. Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication Engineering |
author_facet |
Yazid Muhamad Fitri M.; Nawang Farah M.; Nasir S. Mohd Firdaus S. A.; Yusof Azmi M. |
author_sort |
Yazid |
spelling |
Yazid, Muhamad Fitri M.; Nawang, Farah M.; Nasir, S. Mohd Firdaus S. A.; Yusof, Azmi M. Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication INTELLIGENT MANUFACTURING AND MECHATRONICS, SIMM 2023 English Proceedings Paper In many microfluidic device fabrications, obtaining the hermetic sealing is a great challenge, especially for bonding between non-homogenous material pairs. This work presents the evaluations of non-homogeneous material bonding between dry film photoresist (DFR) and poly-methyl methacrylate (PMMA) substrates using low-pressure and low-temperature direct thermal bonding. DFR is a light-sensitive material and well adhered to the PMMA surface before UV exposure, but its chemical structures changed after being exposed to UV irradiation, which caused the DFR to crosslink permanently. Therefore, the low-pressure and low-temperature (below the glass transition temperature of PMMA, TG = 95 degrees C) bonding evaluation was made by first preparing the base substrate by laminating the DFR on PMMA (PMMA/DFR) and then exposing it under UV i-line irradiation (wavelength 365 nm) for 120 s. The base substrate was later bonded with another PMMA substrate, creating a substrate consisting of the PMMA/DFR + PMMA pairs. Three different surface conditions were evaluated: the PMMA substrate without surface treatment, the PMMA substrate surface treated with isopropanol, and PMMA substrate surface treated with ethanol. Different curing temperatures and times in the inductive oven were carried out. Results revealed that without sufficient clamping pressure, thermal direct bonding of an untreated PMMA substrate surface could not be obtained even after it was cured in an oven at a temperature close to TG. While surface treatment with ethanol revealed promising bonding between PMMA and DFR + PMMA, the bonding coverage area could attain only 50% at best with curing temperature of 90 degrees C for 25 min. Surface treatment with isopropanol revealed an interesting result whereby 90% coverage area of bonded surface obtained when cured in an oven at 90 degrees C for 20 min. Bonding shear stress evaluation produces 1.92 MPa at best. The results obtained in this work offer low-pressure and low-temperature thermal direct bonding which can be used as a guide for future microfluidics device fabrication. SPRINGER-VERLAG SINGAPORE PTE LTD 2195-4356 2195-4364 2024 10.1007/978-981-97-0169-8_35 Engineering WOS:001313737300035 https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001313737300035 |
title |
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication |
title_short |
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication |
title_full |
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication |
title_fullStr |
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication |
title_full_unstemmed |
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication |
title_sort |
Low-Pressure, Thermal Direct Bonding of PMMA-Dry Film Photoresist-PMMA for Microdevice Fabrication |
container_title |
INTELLIGENT MANUFACTURING AND MECHATRONICS, SIMM 2023 |
language |
English |
format |
Proceedings Paper |
description |
In many microfluidic device fabrications, obtaining the hermetic sealing is a great challenge, especially for bonding between non-homogenous material pairs. This work presents the evaluations of non-homogeneous material bonding between dry film photoresist (DFR) and poly-methyl methacrylate (PMMA) substrates using low-pressure and low-temperature direct thermal bonding. DFR is a light-sensitive material and well adhered to the PMMA surface before UV exposure, but its chemical structures changed after being exposed to UV irradiation, which caused the DFR to crosslink permanently. Therefore, the low-pressure and low-temperature (below the glass transition temperature of PMMA, TG = 95 degrees C) bonding evaluation was made by first preparing the base substrate by laminating the DFR on PMMA (PMMA/DFR) and then exposing it under UV i-line irradiation (wavelength 365 nm) for 120 s. The base substrate was later bonded with another PMMA substrate, creating a substrate consisting of the PMMA/DFR + PMMA pairs. Three different surface conditions were evaluated: the PMMA substrate without surface treatment, the PMMA substrate surface treated with isopropanol, and PMMA substrate surface treated with ethanol. Different curing temperatures and times in the inductive oven were carried out. Results revealed that without sufficient clamping pressure, thermal direct bonding of an untreated PMMA substrate surface could not be obtained even after it was cured in an oven at a temperature close to TG. While surface treatment with ethanol revealed promising bonding between PMMA and DFR + PMMA, the bonding coverage area could attain only 50% at best with curing temperature of 90 degrees C for 25 min. Surface treatment with isopropanol revealed an interesting result whereby 90% coverage area of bonded surface obtained when cured in an oven at 90 degrees C for 20 min. Bonding shear stress evaluation produces 1.92 MPa at best. The results obtained in this work offer low-pressure and low-temperature thermal direct bonding which can be used as a guide for future microfluidics device fabrication. |
publisher |
SPRINGER-VERLAG SINGAPORE PTE LTD |
issn |
2195-4356 2195-4364 |
publishDate |
2024 |
container_volume |
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container_issue |
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doi_str_mv |
10.1007/978-981-97-0169-8_35 |
topic |
Engineering |
topic_facet |
Engineering |
accesstype |
|
id |
WOS:001313737300035 |
url |
https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001313737300035 |
record_format |
wos |
collection |
Web of Science (WoS) |
_version_ |
1818940497861804032 |