Er3+-doped SiO2-TeO2-ZnO-Na2 O thin film fabricated by ultrafast laser plasma doping under different ambient atmospheres
Er3+-ions doped SiO2-ZnO-Na2O thin films were fabricated using ultrafast laser plasma doping (ULPD) techniques under different ambient atmospheres; vacuum, nitrogen, oxygen and argon gas. The thickness of the layer produced depends on the ambient atmosphere during fabrication. The layer fabricated u...
| Published in: | Chalcogenide Letters |
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| Main Author: | |
| Format: | Article |
| Language: | English |
| Published: |
S.C. Virtual Company of Phisics S.R.L
2024
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85182482540&doi=10.15251%2fCL.2024.211.11&partnerID=40&md5=541d72f367203f40b8a236ed629305ac |