Raman studied of undoped amorphous carbon thin film deposited by bias assisted-CVD

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Raman studied of undoped amorphous carbon thin film deposited by bias assisted-CVD

The undoped amorphous carbon thin film carbon was deposited at 200°C-350°C by bias assisted-CVD using palm oil as a precursor material. The effect of different substrate deposition temperatures on structural and electrical properties of undoped doped amorphous carbon film was discussed. The structur...

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Bibliographic Details
Published in:	AIP Conference Proceedings
Main Author:	Ishak A.; Fadzilah A.N.; Dayana K.; Saurdi I.; Malek M.F.; Nurbaya Z.; Shafura A.K.; Rusop M.
Format:	Conference paper
Language:	English
Published:	American Institute of Physics Inc. 2018
Online Access:	https://www.scopus.com/inward/record.uri?eid=2-s2.0-85047315005&doi=10.1063%2f1.5036890&partnerID=40&md5=df0be4566af67327f086e0514a2a5b7d

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