Raman studied of undoped amorphous carbon thin film deposited by bias assisted-CVD
The undoped amorphous carbon thin film carbon was deposited at 200°C-350°C by bias assisted-CVD using palm oil as a precursor material. The effect of different substrate deposition temperatures on structural and electrical properties of undoped doped amorphous carbon film was discussed. The structur...
Published in: | AIP Conference Proceedings |
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Main Author: | |
Format: | Conference paper |
Language: | English |
Published: |
American Institute of Physics Inc.
2018
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Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85047315005&doi=10.1063%2f1.5036890&partnerID=40&md5=df0be4566af67327f086e0514a2a5b7d |