Boron-doped amorphous carbon film grown by bias assisted pyrolysis chemical vapor deposition
Boron-doped amorphous carbon (a-C:B) films were successfully synthesized via a bias-assisted pyrolysis-chemical vapor deposition (CVD). The effect of substrate bias on the thickness, surface morphology, electrical properties of a-C:B film were investigated. The AFM measurements and conductivity resu...
| Published in: | IEICE Electronics Express |
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| Main Author: | |
| Format: | Article |
| Language: | English |
| Published: |
Institute of Electronics Information Communication Engineers
2015
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84943819813&doi=10.1587%2felex.11.20140937&partnerID=40&md5=47eb7a4aa5b37131df572ae1daf4f2ff |