Fabrication and characterization of camphor-based amorphous carbon thin films
Pure amorphous carbon (a-C) and nitrogen doped amorphous carbon (a-C: N) thin films were prepared using Thermal Chemical Vapor Deposition (CVD) with deposition temperature ranging from 500°C to 650°C using camphor (C 10H16O) as a precursor from natural source. The physical and optical properties of...
| Published in: | Procedia Engineering |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
Elsevier Ltd
2013
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84891704857&doi=10.1016%2fj.proeng.2013.03.188&partnerID=40&md5=1abf01b4a3b0e78db52dd540afc2f337 |