Influence of RF magnetron sputtering pressure on the structural, optical, and morphological properties of indium tin oxide nanocolumns
In the present study, ITO nanocolumns was successfully deposited onto a glass substrate by RF magnetron sputtering. The effect of deposition pressure was investigated. X-ray diffraction analysis indicates that the intensity of the (400) peak orientation is highest at sputtering pressure of 5 mTorr....
| Published in: | Advanced Materials Research |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
2014
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84891619113&doi=10.4028%2fwww.scientific.net%2fAMR.832.276&partnerID=40&md5=efd355fab4f77a4e2e2814ecf35ccffa |
| Summary: | In the present study, ITO nanocolumns was successfully deposited onto a glass substrate by RF magnetron sputtering. The effect of deposition pressure was investigated. X-ray diffraction analysis indicates that the intensity of the (400) peak orientation is highest at sputtering pressure of 5 mTorr. The results from UV-visible (UV-vis) spectroscopy revealed that the optical transmittance above 80 % was obtained from the all samples in the visible range of 400-800 nm. The larger grain size was observed from the top view of field emission scanning electron microscopy (FESEM) image as the sputtering pressure was increase. Dense nanocolumns array were obtained from the sample deposited at sputtering pressure of 5 mTorr. The surface roughness were decreased at high sputtering pressure of 10 mTorr was observed from atomic force microscopy (AFM) surface morphology. © (2014) Trans Tech Publications, Switzerland. |
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| ISSN: | 10226680 |
| DOI: | 10.4028/www.scientific.net/AMR.832.276 |