Study of annealed nickel (Ni)/indium tin oxide (ITO) nanostructures prepared by RF magnetron sputtering

Study of annealed nickel (Ni)/indium tin oxide (ITO) nanostructures prepared by RF magnetron sputtering

Nickel (Ni) / indium tin oxide (ITO) nanostructures were deposited on glass and silicon (111) substrates by RF magnetron sputtering using a nickel target and ITO (In-Sn, 90%-10%) targets. The post-deposition annealing has been performed for Ni/ITO films in air and the effect of annealing temperature...

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Bibliographic Details
Published in:Advanced Materials Research
Main Author: Sobri M.; Shuhaimi A.; Hakim K.M.; Mamat M.H.; Najwa S.; Mazwan M.; Ameera A.; Musa M.Z.; Rusop M.
Format: Conference paper
Language:English
Published: 2014
Online Access:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84891607167&doi=10.4028%2fwww.scientific.net%2fAMR.832.695&partnerID=40&md5=6d899660ed5708de7ec54832d9e7f140

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