Crystalline and structural properties dependence on RF power and deposition temperature of sputtered nanocrystalline silicon thin films on teflon and glass substrates

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Crystalline and structural properties dependence on RF power and deposition temperature of sputtered nanocrystalline silicon thin films on teflon and glass substrates

Nanocrystalline silicon (nc-Si) thin films were deposited on glass and polytetrafluoroethylene (PTFE, teflon) substrates using Radio frequency (RF) magnetron sputtering. The effect of RF power and deposition temperature on the physical and structural properties of nc- Si on the glass and Teflon subs...

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Bibliographic Details
Published in:	Advanced Materials Research
Main Author:	Mahzan N.H.; Hashim S.B.; Herman S.H.; Rusop M.
Format:	Conference paper
Language:	English
Published:	2012
Online Access:	https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869385403&doi=10.4028%2fwww.scientific.net%2fAMR.576.475&partnerID=40&md5=46cb8b22aeebb97bf9aa762febe94269

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