Room-temperature deposition of silicon thin films by RF magnetron sputtering

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Room-temperature deposition of silicon thin films by RF magnetron sputtering

Silicon thin film was successfully deposited on glass substrate using Radio frequency (RF) magnetron sputtering. The effect of deposition pressure on the physical and structural properties of thin films on the glass substrate was studied. The film thickness and deposition rate decreased with decreas...

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Bibliographic Details
Published in:	Advanced Materials Research
Main Author:	Hashim S.B.; Mahzan N.H.; Herman S.H.; Rusop M.
Format:	Conference paper
Language:	English
Published:	2012
Online Access:	https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869383615&doi=10.4028%2fwww.scientific.net%2fAMR.576.543&partnerID=40&md5=f821b2fcc1c51c5f4ce96ec1b842f98f

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