Room-temperature deposition of silicon thin films by RF magnetron sputtering
Silicon thin film was successfully deposited on glass substrate using Radio frequency (RF) magnetron sputtering. The effect of deposition pressure on the physical and structural properties of thin films on the glass substrate was studied. The film thickness and deposition rate decreased with decreas...
| Published in: | Advanced Materials Research |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
2012
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869383615&doi=10.4028%2fwww.scientific.net%2fAMR.576.543&partnerID=40&md5=f821b2fcc1c51c5f4ce96ec1b842f98f |