Radio frequency magnetron sputtering growth of Ni-doped ZnO thin films with nanocolumnar structures

• Published in: JOURNAL OF CRYSTAL GROWTH
• Main Authors: Mazwan, M.; Ng, S. S.; Baharin, M. S. N. Samsol; Pakhuruddin, M. Z.; Abu Bakar, A. S.; Rahman, M. N. Abd.; Al-Zuhairi, O.; Abd Rahim, A. F.
• Format: Article
• Language: English
• Published: ELSEVIER 2024
• Subjects: Crystallography; Materials Science; Physics
• Online Access: https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001288670900001
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/j.jcrysgro.2024.127835

This study describes the RF magnetron sputtering growth of nickel (Ni) doped zinc oxide (ZnO) thin films with nanocolumns (NCs) structures. Using a nickel seed layer, homogeneous and vertically aligned ZnO nanocolumns with a diameter of around 30 nm were successfully grown. The X-ray diffraction (XRD) results confirmed the incorporation of Ni atoms into the ZnO lattice, producing single crystalline structures without secondary phases. High-resolution transmission electron microscopy showed clear lattice planes with a d-spacing value of 3.243 & Aring; corresponding to the wurtzite phase of ZnO. Optimal crystalline quality was achieved by growing the films at 300 degrees C followed by thermal annealing at 300-500 degrees C in an oxygen ambient.