Er3+-doped SiO2-TeO2-ZnO-Na2O thin film fabricated by ultrafast laser plasma doping under different ambient atmospheres
Er3+-ions doped SiO2-ZnO-Na2O thin films were fabricated using ultrafast laser plasma doping (ULPD) techniques under different ambient atmospheres; vacuum, nitrogen, oxygen and argon gas. The thickness of the layer produced depends on the ambient atmosphere during fabrication. The layer fabricated u...
| 出版年: | CHALCOGENIDE LETTERS |
|---|---|
| 主要な著者: | , |
| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
VIRTUAL CO PHYSICS SRL
2024
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| 主題: | |
| オンライン･アクセス: | https://www-webofscience-com.uitm.idm.oclc.org/wos/woscc/full-record/WOS:001143220000002 |