Particles contaminations detection during plasma etching process by using k-nearest neighbors and Fuzzy k-nearest neighbors
This paper present the particle contamination detection during plasma etching process by using k-nearest neighbor (kNN) and Fuzzy k-nearest neighbor (FkNN). In the process of manufacturing semiconductor devices, detecting particle contamination in process tool is a vital factor for determining for p...
| Published in: | Proceedings - 6th IEEE International Conference on Control System, Computing and Engineering, ICCSCE 2016 |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
Institute of Electrical and Electronics Engineers Inc.
2017
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85018974073&doi=10.1109%2fICCSCE.2016.7893630&partnerID=40&md5=f742d84246ce038b6844e0636e8cdf5f |