2-s2.0-85018974073. (2017). Particles contaminations detection during plasma etching process by using k-nearest neighbors and Fuzzy k-nearest neighbors. Proceedings - 6th IEEE International Conference on Control System, Computing and Engineering, ICCSCE 2016. https://doi.org/10.1109/ICCSCE.2016.7893630
Chicagoスタイル(17版)引用形式2-s2.0-85018974073. "Particles Contaminations Detection During Plasma Etching Process by Using K-nearest Neighbors and Fuzzy K-nearest Neighbors." Proceedings - 6th IEEE International Conference on Control System, Computing and Engineering, ICCSCE 2016 2017. https://doi.org/10.1109/ICCSCE.2016.7893630.
MLA(8版)引用形式2-s2.0-85018974073. "Particles Contaminations Detection During Plasma Etching Process by Using K-nearest Neighbors and Fuzzy K-nearest Neighbors." Proceedings - 6th IEEE International Conference on Control System, Computing and Engineering, ICCSCE 2016, 2017, https://doi.org/10.1109/ICCSCE.2016.7893630.