Effect of annealing on structural, optical, and electrical properties of nickel (Ni)/indium tin oxide (ITO) nanostructures prepared by RF magnetron sputtering
Nickel (Ni)/indium tin oxide (ITO) nanostructures were deposited on glass and silicon (1 1 1) substrates by RF magnetron sputtering using nickel and ITO (In-Sn, 90-10%) targets. The post-deposition annealing has been performed for Ni/ITO films in air. The effect of annealing temperature on the elect...
| 发表在: | Superlattices and Microstructures |
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| 主要作者: | |
| 格式: | 文件 |
| 语言: | English |
| 出版: |
Academic Press
2014
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| 在线阅读: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84897405033&doi=10.1016%2fj.spmi.2014.02.010&partnerID=40&md5=7a17598b8fe51220375c51f97c7a2b83 |