Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique

Nickel (Ni)-doped zinc oxide (ZnO) layers were deposited simultaneously by radio frequency (RF) magnetron sputtering from a Ni and ZnO target. Ni seed layer was used as catalyst prior to the deposition of Ni-doped ZnO. This paper studies the influence of deposition temperature to the Ni seed layer a...

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發表在:Advanced Materials Research
主要作者: 2-s2.0-84896804085
格式: Conference paper
語言:English
出版: 2014
在線閱讀:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896804085&doi=10.4028%2fwww.scientific.net%2fAMR.895.3&partnerID=40&md5=b30b50cae9c3637db95788f3fc5a9765
id Mazwan M.; Shuhaimi A.; Sobri M.; Hakim K.M.; Ameera A.; Najwa S.; Mamat M.H.; Musa M.Z.; Rusop M.
spelling Mazwan M.; Shuhaimi A.; Sobri M.; Hakim K.M.; Ameera A.; Najwa S.; Mamat M.H.; Musa M.Z.; Rusop M.
2-s2.0-84896804085
Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
2014
Advanced Materials Research
895

10.4028/www.scientific.net/AMR.895.3
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896804085&doi=10.4028%2fwww.scientific.net%2fAMR.895.3&partnerID=40&md5=b30b50cae9c3637db95788f3fc5a9765
Nickel (Ni)-doped zinc oxide (ZnO) layers were deposited simultaneously by radio frequency (RF) magnetron sputtering from a Ni and ZnO target. Ni seed layer was used as catalyst prior to the deposition of Ni-doped ZnO. This paper studies the influence of deposition temperature to the Ni seed layer and Ni-doped ZnO layer at different temperature. The sample was characterized using field emission scanning electron microscopy (FESEM), x-ray diffraction (XRD) and UV visible spectroscopy (UV-vis) to determine the structural, crystallinity and optical properties of the deposited layer. FESEM surface analysis shows that uniformity of the thin films is improved when deposition temperature is increased. The transmittance of the deposited thin films was improved when temperatures are increased to 500°C. © (2014) Trans Tech Publications, Switzerland.

10226680
English
Conference paper

author 2-s2.0-84896804085
spellingShingle 2-s2.0-84896804085
Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
author_facet 2-s2.0-84896804085
author_sort 2-s2.0-84896804085
title Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
title_short Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
title_full Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
title_fullStr Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
title_full_unstemmed Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
title_sort Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique
publishDate 2014
container_title Advanced Materials Research
container_volume 895
container_issue
doi_str_mv 10.4028/www.scientific.net/AMR.895.3
url https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896804085&doi=10.4028%2fwww.scientific.net%2fAMR.895.3&partnerID=40&md5=b30b50cae9c3637db95788f3fc5a9765
description Nickel (Ni)-doped zinc oxide (ZnO) layers were deposited simultaneously by radio frequency (RF) magnetron sputtering from a Ni and ZnO target. Ni seed layer was used as catalyst prior to the deposition of Ni-doped ZnO. This paper studies the influence of deposition temperature to the Ni seed layer and Ni-doped ZnO layer at different temperature. The sample was characterized using field emission scanning electron microscopy (FESEM), x-ray diffraction (XRD) and UV visible spectroscopy (UV-vis) to determine the structural, crystallinity and optical properties of the deposited layer. FESEM surface analysis shows that uniformity of the thin films is improved when deposition temperature is increased. The transmittance of the deposited thin films was improved when temperatures are increased to 500°C. © (2014) Trans Tech Publications, Switzerland.
publisher
issn 10226680
language English
format Conference paper
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