Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation
Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic technique...
Published in: | Materials Research Innovations |
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Taylor and Francis Ltd.
2023
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2-s2.0-85153589143 Raad R.; Abdallh M.; Yousif E.; Zainulabdeen K.; Ahmed A.; Al-Khazrajy O.; Bofaroosha M.; Jawad A.H. Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation 2023 Materials Research Innovations 27 7 10.1080/14328917.2023.2204572 https://www.scopus.com/inward/record.uri?eid=2-s2.0-85153589143&doi=10.1080%2f14328917.2023.2204572&partnerID=40&md5=f21c2742d66602fb889b09535c6d9e94 Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order. © 2023 Informa UK Limited, trading as Taylor & Francis Group. Taylor and Francis Ltd. 14328917 English Article |
author |
Raad R.; Abdallh M.; Yousif E.; Zainulabdeen K.; Ahmed A.; Al-Khazrajy O.; Bofaroosha M.; Jawad A.H. |
spellingShingle |
Raad R.; Abdallh M.; Yousif E.; Zainulabdeen K.; Ahmed A.; Al-Khazrajy O.; Bofaroosha M.; Jawad A.H. Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
author_facet |
Raad R.; Abdallh M.; Yousif E.; Zainulabdeen K.; Ahmed A.; Al-Khazrajy O.; Bofaroosha M.; Jawad A.H. |
author_sort |
Raad R.; Abdallh M.; Yousif E.; Zainulabdeen K.; Ahmed A.; Al-Khazrajy O.; Bofaroosha M.; Jawad A.H. |
title |
Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
title_short |
Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
title_full |
Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
title_fullStr |
Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
title_full_unstemmed |
Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
title_sort |
Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation |
publishDate |
2023 |
container_title |
Materials Research Innovations |
container_volume |
27 |
container_issue |
7 |
doi_str_mv |
10.1080/14328917.2023.2204572 |
url |
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85153589143&doi=10.1080%2f14328917.2023.2204572&partnerID=40&md5=f21c2742d66602fb889b09535c6d9e94 |
description |
Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order. © 2023 Informa UK Limited, trading as Taylor & Francis Group. |
publisher |
Taylor and Francis Ltd. |
issn |
14328917 |
language |
English |
format |
Article |
accesstype |
|
record_format |
scopus |
collection |
Scopus |
_version_ |
1809677890492563456 |