Structural and optical properties of nickel-doped zinc oxide thin film on nickel seed layer deposited by RF magnetron sputtering technique

• Published in: Advanced Materials Research
• Main Author: Mazwan M.; Shuhaimi A.; Sobri M.; Hakim K.M.; Ameera A.; Najwa S.; Mamat M.H.; Musa M.Z.; Rusop M.
• Format: Conference paper
• Language: English
• Published: 2014
• Online Access: https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896804085&doi=10.4028%2fwww.scientific.net%2fAMR.895.3&partnerID=40&md5=b30b50cae9c3637db95788f3fc5a9765
• ISSN: 10226680
• DOI: 10.4028/www.scientific.net/AMR.895.3

Nickel (Ni)-doped zinc oxide (ZnO) layers were deposited simultaneously by radio frequency (RF) magnetron sputtering from a Ni and ZnO target. Ni seed layer was used as catalyst prior to the deposition of Ni-doped ZnO. This paper studies the influence of deposition temperature to the Ni seed layer and Ni-doped ZnO layer at different temperature. The sample was characterized using field emission scanning electron microscopy (FESEM), x-ray diffraction (XRD) and UV visible spectroscopy (UV-vis) to determine the structural, crystallinity and optical properties of the deposited layer. FESEM surface analysis shows that uniformity of the thin films is improved when deposition temperature is increased. The transmittance of the deposited thin films was improved when temperatures are increased to 500°C. © (2014) Trans Tech Publications, Switzerland.