Effects of pressure dependence on nanocolumnar zinc oxide deposited by RF magnetron sputtering

Nanocolumnar zinc oxide (ZnO) was deposited on glass substrates by RF magnetron sputtering. It was performed with a ZnO target at RF power of 200 W. The deposition was carried out in argon and oxygen ambient at the ratio of 10 and 5 sccm respectively, with total deposition time of 1 hour. The growth...

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Bibliographic Details
Published in:Advanced Materials Research
Main Author: Ameera N.; Shuhaimi A.; Najwa S.; Hakim K.M.; Mazwan M.; Sobri M.; Mamat M.H.; Musa M.Z.; Rusop M.
Format: Conference paper
Language:English
Published: 2014
Online Access:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84891591510&doi=10.4028%2fwww.scientific.net%2fAMR.832.787&partnerID=40&md5=43713f703ba7a562de4783c9023e357c
Description
Summary:Nanocolumnar zinc oxide (ZnO) was deposited on glass substrates by RF magnetron sputtering. It was performed with a ZnO target at RF power of 200 W. The deposition was carried out in argon and oxygen ambient at the ratio of 10 and 5 sccm respectively, with total deposition time of 1 hour. The growth temperature was fixed at 500°C and deposition pressure specified at 3, 5 and 10 mTorr. It was observed that the morphological and photoluminescence properties of ZnO strongly dependent on the deposition pressure. The ZnO mean grain area was inversely related with the surface roughness. The best morphological and photoluminescence properties was found to be associated with ZnO grown at 10 mTorr. Smooth ZnO surface and lowest defects related emission in PL was obtained for the respective sample. © (2014) Trans Tech Publications, Switzerland.
ISSN:10226680
DOI:10.4028/www.scientific.net/AMR.832.787