Influence of post annealing temperature on the properties of ZnO films prepared by RF magnetron sputtering

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Influence of post annealing temperature on the properties of ZnO films prepared by RF magnetron sputtering

Zinc Oxide (ZnO) films were prepared on unheated glass substrate by radio frequency (RF) magnetron sputtering technique and post deposition annealing of the ZnO thin film were performed at 350, 400, 450 and 500°C. Post annealing temperature was found to improve the structural and electrical characte...

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Bibliographic Details
Published in:	Advanced Materials Research
Main Author:	Ahmad S.; Md Sin N.D.; Berhan M.N.; Rusop M.
Format:	Conference paper
Language:	English
Published:	2012
Online Access:	https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869786776&doi=10.4028%2fwww.scientific.net%2fAMR.576.602&partnerID=40&md5=6ad90b5e59c53fc326276307debfe9ee

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