Carbon-based solar cell from amorphous carbon with nitrogen incorporation

Nitrogen doped amorphous carbon (n-C:N) solar cells were successfully prepared using a simple and low cost Chemical Vapor Deposition (CVD) method using camphor oil as a precursor. Four samples of n-C:N were deposited by varying the deposition temperature (500°C, 550°C, 600°C, 650°C). The fabricated...

Full description

Bibliographic Details
Published in:Advanced Materials Research
Main Author: Fadzilah A.N.; Dayana K.; Rusop M.
Format: Conference paper
Language:English
Published: 2012
Online Access:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869384492&doi=10.4028%2fwww.scientific.net%2fAMR.576.785&partnerID=40&md5=8b082355b3d845480cb0b711b0e5ad96
id 2-s2.0-84869384492
spelling 2-s2.0-84869384492
Fadzilah A.N.; Dayana K.; Rusop M.
Carbon-based solar cell from amorphous carbon with nitrogen incorporation
2012
Advanced Materials Research
576

10.4028/www.scientific.net/AMR.576.785
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869384492&doi=10.4028%2fwww.scientific.net%2fAMR.576.785&partnerID=40&md5=8b082355b3d845480cb0b711b0e5ad96
Nitrogen doped amorphous carbon (n-C:N) solar cells were successfully prepared using a simple and low cost Chemical Vapor Deposition (CVD) method using camphor oil as a precursor. Four samples of n-C:N were deposited by varying the deposition temperature (500°C, 550°C, 600°C, 650°C). The fabricated solar cell using n-C:N with the configuration of Au/n-C:N/p-Si/Au achieved an increasing efficiency as temperature increase (0.000202% to 0.001089%). As a reference, pure a-C was deposited at 500°C and exhibit 0.000048% efficiency. The current-voltage (I-V) graph emphasized on the linear graph (ohmic) for the a-C thin films, whereas for the p-n device structure, a rectifying curve was obtained. Electrical conductitivity possesses increasing value (1.69 x 10-2 to 22 Ω-1 cm-1) due to increasing sp2 ratio in a-C as temperature increase. The rectifying curves signify the heterojunction between the n-doped a-C film and the p-Si substrate and designate the generation of electron-hole pair of the samples under illumination. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illumination: 100 mW/cm2, 25°C) and optical band gap for the nitrogen doped a-C is reported from 0.75 eV to 0.25 eV as temperature increase. © (2012) Trans Tech Publications, Switzerland.

10226680
English
Conference paper

author Fadzilah A.N.; Dayana K.; Rusop M.
spellingShingle Fadzilah A.N.; Dayana K.; Rusop M.
Carbon-based solar cell from amorphous carbon with nitrogen incorporation
author_facet Fadzilah A.N.; Dayana K.; Rusop M.
author_sort Fadzilah A.N.; Dayana K.; Rusop M.
title Carbon-based solar cell from amorphous carbon with nitrogen incorporation
title_short Carbon-based solar cell from amorphous carbon with nitrogen incorporation
title_full Carbon-based solar cell from amorphous carbon with nitrogen incorporation
title_fullStr Carbon-based solar cell from amorphous carbon with nitrogen incorporation
title_full_unstemmed Carbon-based solar cell from amorphous carbon with nitrogen incorporation
title_sort Carbon-based solar cell from amorphous carbon with nitrogen incorporation
publishDate 2012
container_title Advanced Materials Research
container_volume 576
container_issue
doi_str_mv 10.4028/www.scientific.net/AMR.576.785
url https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869384492&doi=10.4028%2fwww.scientific.net%2fAMR.576.785&partnerID=40&md5=8b082355b3d845480cb0b711b0e5ad96
description Nitrogen doped amorphous carbon (n-C:N) solar cells were successfully prepared using a simple and low cost Chemical Vapor Deposition (CVD) method using camphor oil as a precursor. Four samples of n-C:N were deposited by varying the deposition temperature (500°C, 550°C, 600°C, 650°C). The fabricated solar cell using n-C:N with the configuration of Au/n-C:N/p-Si/Au achieved an increasing efficiency as temperature increase (0.000202% to 0.001089%). As a reference, pure a-C was deposited at 500°C and exhibit 0.000048% efficiency. The current-voltage (I-V) graph emphasized on the linear graph (ohmic) for the a-C thin films, whereas for the p-n device structure, a rectifying curve was obtained. Electrical conductitivity possesses increasing value (1.69 x 10-2 to 22 Ω-1 cm-1) due to increasing sp2 ratio in a-C as temperature increase. The rectifying curves signify the heterojunction between the n-doped a-C film and the p-Si substrate and designate the generation of electron-hole pair of the samples under illumination. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illumination: 100 mW/cm2, 25°C) and optical band gap for the nitrogen doped a-C is reported from 0.75 eV to 0.25 eV as temperature increase. © (2012) Trans Tech Publications, Switzerland.
publisher
issn 10226680
language English
format Conference paper
accesstype
record_format scopus
collection Scopus
_version_ 1809677611450761216