Carbon-based solar cell from amorphous carbon with nitrogen incorporation
Nitrogen doped amorphous carbon (n-C:N) solar cells were successfully prepared using a simple and low cost Chemical Vapor Deposition (CVD) method using camphor oil as a precursor. Four samples of n-C:N were deposited by varying the deposition temperature (500°C, 550°C, 600°C, 650°C). The fabricated...
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2-s2.0-84869384492 Fadzilah A.N.; Dayana K.; Rusop M. Carbon-based solar cell from amorphous carbon with nitrogen incorporation 2012 Advanced Materials Research 576 10.4028/www.scientific.net/AMR.576.785 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869384492&doi=10.4028%2fwww.scientific.net%2fAMR.576.785&partnerID=40&md5=8b082355b3d845480cb0b711b0e5ad96 Nitrogen doped amorphous carbon (n-C:N) solar cells were successfully prepared using a simple and low cost Chemical Vapor Deposition (CVD) method using camphor oil as a precursor. Four samples of n-C:N were deposited by varying the deposition temperature (500°C, 550°C, 600°C, 650°C). The fabricated solar cell using n-C:N with the configuration of Au/n-C:N/p-Si/Au achieved an increasing efficiency as temperature increase (0.000202% to 0.001089%). As a reference, pure a-C was deposited at 500°C and exhibit 0.000048% efficiency. The current-voltage (I-V) graph emphasized on the linear graph (ohmic) for the a-C thin films, whereas for the p-n device structure, a rectifying curve was obtained. Electrical conductitivity possesses increasing value (1.69 x 10-2 to 22 Ω-1 cm-1) due to increasing sp2 ratio in a-C as temperature increase. The rectifying curves signify the heterojunction between the n-doped a-C film and the p-Si substrate and designate the generation of electron-hole pair of the samples under illumination. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illumination: 100 mW/cm2, 25°C) and optical band gap for the nitrogen doped a-C is reported from 0.75 eV to 0.25 eV as temperature increase. © (2012) Trans Tech Publications, Switzerland. 10226680 English Conference paper |
author |
Fadzilah A.N.; Dayana K.; Rusop M. |
spellingShingle |
Fadzilah A.N.; Dayana K.; Rusop M. Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
author_facet |
Fadzilah A.N.; Dayana K.; Rusop M. |
author_sort |
Fadzilah A.N.; Dayana K.; Rusop M. |
title |
Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
title_short |
Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
title_full |
Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
title_fullStr |
Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
title_full_unstemmed |
Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
title_sort |
Carbon-based solar cell from amorphous carbon with nitrogen incorporation |
publishDate |
2012 |
container_title |
Advanced Materials Research |
container_volume |
576 |
container_issue |
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doi_str_mv |
10.4028/www.scientific.net/AMR.576.785 |
url |
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84869384492&doi=10.4028%2fwww.scientific.net%2fAMR.576.785&partnerID=40&md5=8b082355b3d845480cb0b711b0e5ad96 |
description |
Nitrogen doped amorphous carbon (n-C:N) solar cells were successfully prepared using a simple and low cost Chemical Vapor Deposition (CVD) method using camphor oil as a precursor. Four samples of n-C:N were deposited by varying the deposition temperature (500°C, 550°C, 600°C, 650°C). The fabricated solar cell using n-C:N with the configuration of Au/n-C:N/p-Si/Au achieved an increasing efficiency as temperature increase (0.000202% to 0.001089%). As a reference, pure a-C was deposited at 500°C and exhibit 0.000048% efficiency. The current-voltage (I-V) graph emphasized on the linear graph (ohmic) for the a-C thin films, whereas for the p-n device structure, a rectifying curve was obtained. Electrical conductitivity possesses increasing value (1.69 x 10-2 to 22 Ω-1 cm-1) due to increasing sp2 ratio in a-C as temperature increase. The rectifying curves signify the heterojunction between the n-doped a-C film and the p-Si substrate and designate the generation of electron-hole pair of the samples under illumination. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illumination: 100 mW/cm2, 25°C) and optical band gap for the nitrogen doped a-C is reported from 0.75 eV to 0.25 eV as temperature increase. © (2012) Trans Tech Publications, Switzerland. |
publisher |
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issn |
10226680 |
language |
English |
format |
Conference paper |
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scopus |
collection |
Scopus |
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1809677611450761216 |