Bandgap alteration of transparent zinc oxide thin film with Mg dopant

We have successfully demonstrated a bandgap alteration of transparent zinc oxide (ZnO) thin film with Mg dopant by using sol-gel spin coating technique. By increasing the dopant from 0 to 30 atomic percent (at.%), a decrement value in the cutoff is observed, where the absorption edge shifts continuo...

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Bibliographic Details
Published in:Transactions on Electrical and Electronic Materials
Main Author: Salina M.; Ahmad R.; Suriani A.B.; Rusop M.
Format: Article
Language:English
Published: 2012
Online Access:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84860650520&doi=10.4313%2fTEEM.2012.13.2.64&partnerID=40&md5=d5b503cd0f5487778531b031f467bc74
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Summary:We have successfully demonstrated a bandgap alteration of transparent zinc oxide (ZnO) thin film with Mg dopant by using sol-gel spin coating technique. By increasing the dopant from 0 to 30 atomic percent (at.%), a decrement value in the cutoff is observed, where the absorption edge shifts continuously to the shorter wavelength side, towards 300 nm. This resulted in a significant bandgap increment from 3.28 to 3.57 eV. However, the transmittance of the thin film at 350-800 nm gradually downgraded, from 93 to 80 % which is most probably due to the grain size that becomes bigger, and it also affected the electrical properties. The decrement from 45 to 0.05 mA at +10 V was observed in the I-V characteristics, concluding the significant relationship; where higher optical bandgap materials will exhibit lower conductivity. These findings may be useful in optoelectronics devices. © 2012 Kieeme. All rights reserved.
ISSN:20927592
DOI:10.4313/TEEM.2012.13.2.64