Properties of amorphous carbon thin films for solar cell applications

• Published in: AIP Conference Proceedings
• Main Author: Mohamad F.; Hanib N.M.; Noor U.M.; Rusop M.
• Format: Conference paper
• Language: English
• Published: 2010
• Online Access: https://www.scopus.com/inward/record.uri?eid=2-s2.0-77953116032&doi=10.1063%2f1.3377800&partnerID=40&md5=bf4fe6c9f6eba475265122b152d4fed4

This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrical properties and crystallinity of these films have been studied using Analytical Scanning Electron Microscope (SEM) JEOL JSM-6360LA, Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software) and the D5000 Siemen Difractrometer (XRD) respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow also showed a secondary impact on the properties of a-C thin films. © 2010 American Institute of Physics.