Properties of amorphous carbon thin films for solar cell applications
This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrica...
| Published in: | AIP Conference Proceedings |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
2010
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-77953116032&doi=10.1063%2f1.3377800&partnerID=40&md5=bf4fe6c9f6eba475265122b152d4fed4 |
| Summary: | This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrical properties and crystallinity of these films have been studied using Analytical Scanning Electron Microscope (SEM) JEOL JSM-6360LA, Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software) and the D5000 Siemen Difractrometer (XRD) respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow also showed a secondary impact on the properties of a-C thin films. © 2010 American Institute of Physics. |
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| ISSN: | 15517616 |
| DOI: | 10.1063/1.3377800 |