SEM characterization of ZnO thin films deposited by dip-coating technique
In this study, ZnO thin films were deposited on the silicon substrate by using dip-coating method. To prepare zinc solution, zinc acetate dehydrate was used as starting material and dissolved in 2-methoexyethanol. Monoethanolamine was used in this solution as stabilizer. Then, the solution was stirr...
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2009
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2-s2.0-70450245634 Zakaria N.Z.; Amizam S.; Rusop M. SEM characterization of ZnO thin films deposited by dip-coating technique 2009 AIP Conference Proceedings 1136 10.1063/1.3160257 https://www.scopus.com/inward/record.uri?eid=2-s2.0-70450245634&doi=10.1063%2f1.3160257&partnerID=40&md5=ed701f9cb3d4b881cf9cf58d898fd80d In this study, ZnO thin films were deposited on the silicon substrate by using dip-coating method. To prepare zinc solution, zinc acetate dehydrate was used as starting material and dissolved in 2-methoexyethanol. Monoethanolamine was used in this solution as stabilizer. Then, the solution was stirred at 60°C for one hour and stayed at room temperature for one night. Thin film was obtained by dip coating the solution on silicon substrates at different withdrawal speeds. The effect of different withdrawal speed on the surface morphology of the ZnO thin film was investigated scanning electron microscope (SEM).The SEM image showed that the grain size has decreased as speed increased. © 2009 American Institute of Physics. 15517616 English Conference paper |
author |
Zakaria N.Z.; Amizam S.; Rusop M. |
spellingShingle |
Zakaria N.Z.; Amizam S.; Rusop M. SEM characterization of ZnO thin films deposited by dip-coating technique |
author_facet |
Zakaria N.Z.; Amizam S.; Rusop M. |
author_sort |
Zakaria N.Z.; Amizam S.; Rusop M. |
title |
SEM characterization of ZnO thin films deposited by dip-coating technique |
title_short |
SEM characterization of ZnO thin films deposited by dip-coating technique |
title_full |
SEM characterization of ZnO thin films deposited by dip-coating technique |
title_fullStr |
SEM characterization of ZnO thin films deposited by dip-coating technique |
title_full_unstemmed |
SEM characterization of ZnO thin films deposited by dip-coating technique |
title_sort |
SEM characterization of ZnO thin films deposited by dip-coating technique |
publishDate |
2009 |
container_title |
AIP Conference Proceedings |
container_volume |
1136 |
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doi_str_mv |
10.1063/1.3160257 |
url |
https://www.scopus.com/inward/record.uri?eid=2-s2.0-70450245634&doi=10.1063%2f1.3160257&partnerID=40&md5=ed701f9cb3d4b881cf9cf58d898fd80d |
description |
In this study, ZnO thin films were deposited on the silicon substrate by using dip-coating method. To prepare zinc solution, zinc acetate dehydrate was used as starting material and dissolved in 2-methoexyethanol. Monoethanolamine was used in this solution as stabilizer. Then, the solution was stirred at 60°C for one hour and stayed at room temperature for one night. Thin film was obtained by dip coating the solution on silicon substrates at different withdrawal speeds. The effect of different withdrawal speed on the surface morphology of the ZnO thin film was investigated scanning electron microscope (SEM).The SEM image showed that the grain size has decreased as speed increased. © 2009 American Institute of Physics. |
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issn |
15517616 |
language |
English |
format |
Conference paper |
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record_format |
scopus |
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Scopus |
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1809677914842595328 |